NF3 is used as a replacement for PFCs (mostly C2 F6 ) and SF6 in the electronics industry. It is typically used in plasma etching and chamber cleaning during the manufacture of semi-conductors and LCD panels (Liquid Crystal Display). NF3 is broken down into nitrogen and fluorine gases in situ, and the resulting fluorine radicals are the active cleaning agents that attack the poly-silicon. NF3 is also used in the photovoltaic industry (thin-film solar cells) for “texturing, phosphorus silicate glass (PSG) removal, edge isolation and reactor cleaning after deposition of silicon nitrate or film silicon.” NF3 is further used in hydrogen fluoride and deuterium fluoride lasers, which are types of chemical lasers.
NITROGEN TRIFLUORIDE
